epitaxial wafer

简明释义

外延生长薄片

英英释义

例句

1.The integration of epitaxial wafers 外延晶圆 into microelectronics has revolutionized the industry.

将epitaxial wafers 外延晶圆集成到微电子学中已经彻底改变了这一行业。

2.To achieve better electronic properties, we need to optimize the growth conditions of the epitaxial wafer 外延晶圆.

为了获得更好的电子特性，我们需要优化epitaxial wafer 外延晶圆的生长条件。

3.Researchers are investigating new materials to improve the efficiency of epitaxial wafers 外延晶圆 used in solar cells.

研究人员正在调查新材料，以提高用于太阳能电池的epitaxial wafers 外延晶圆的效率。

4.The production of high-performance transistors often requires a high-quality epitaxial wafer 外延晶圆 as the substrate.

高性能晶体管的生产通常需要高质量的epitaxial wafer 外延晶圆作为基底。

5.The yield rate of devices fabricated on epitaxial wafers 外延晶圆 can significantly impact overall production costs.

在epitaxial wafers 外延晶圆上制造的设备的良率可以显著影响整体生产成本。

作文

In the field of semiconductor manufacturing, the term epitaxial wafer refers to a thin slice of semiconductor material that has been grown on top of a substrate in a highly controlled manner. This technique is crucial for the production of high-quality electronic devices, such as transistors and integrated circuits. The process involves the deposition of a crystalline layer on the surface of the substrate, which allows for the creation of structures with specific electrical properties. The significance of epitaxial wafer technology cannot be overstated, as it enables the development of advanced materials that are essential for modern electronics.The epitaxy process, from which the term epitaxial wafer derives, involves several methods, including chemical vapor deposition (CVD) and molecular beam epitaxy (MBE). Each of these methods has its unique advantages and applications. For example, CVD is widely used for producing large-area wafers, while MBE is known for its precision in controlling the thickness and composition of the deposited layers. The choice of method often depends on the specific requirements of the device being manufactured.One of the primary benefits of using epitaxial wafers is the ability to engineer the electronic properties of the material. By carefully selecting the type of semiconductor and the doping elements used during the epitaxy process, manufacturers can tailor the electrical characteristics to suit particular applications. This level of customization is crucial for optimizing the performance of devices such as lasers, solar cells, and high-speed transistors.Moreover, epitaxial wafers play a significant role in the development of heterostructures, which are materials composed of two or more different semiconductors. These structures can exhibit unique electronic and optical properties that are not present in their individual components. Heterostructures are fundamental in advancing technologies like quantum wells, which are essential for the operation of modern lasers and photodetectors.The market for epitaxial wafers has been growing steadily, driven by the increasing demand for high-performance electronic devices. As industries continue to push the boundaries of technology, the need for innovative materials will only intensify. Companies that specialize in the production of epitaxial wafers are at the forefront of this trend, continuously researching and developing new techniques to improve quality and efficiency.In conclusion, the concept of epitaxial wafer is integral to the semiconductor industry and the advancement of electronic technology. Through precise control of material properties and the ability to create complex structures, epitaxial wafers facilitate the development of cutting-edge devices that power our modern world. As technology continues to evolve, the importance of understanding and mastering the production of epitaxial wafers will remain paramount for engineers and scientists alike.

在半导体制造领域，术语外延晶圆指的是在基底上以高度控制的方式生长的薄片半导体材料。这种技术对于生产高质量电子设备至关重要，例如晶体管和集成电路。该过程涉及在基底表面沉积一层晶体层，从而允许创建具有特定电气特性的结构。外延晶圆技术的重要性不容小觑，因为它使得现代电子设备所需的先进材料的发展成为可能。外延过程是外延晶圆一词的来源，涉及几种方法，包括化学气相沉积（CVD）和分子束外延（MBE）。这些方法各有其独特的优势和应用。例如，CVD广泛用于生产大面积晶圆，而MBE则因其在控制沉积层的厚度和成分方面的精确性而闻名。选择方法通常取决于制造的设备的具体要求。使用外延晶圆的主要好处之一是能够工程化材料的电子特性。通过在外延过程中仔细选择半导体类型和掺杂元素，制造商可以根据特定应用量身定制电气特性。这种定制程度对于优化激光器、太阳能电池和高速晶体管等设备的性能至关重要。此外，外延晶圆在异质结构的发展中也发挥着重要作用，异质结构是由两种或多种不同半导体组成的材料。这些结构可以表现出其单独成分中不存在的独特电子和光学特性。异质结构在推动现代激光器和光电探测器等技术的进步中是基础。由于对高性能电子设备需求的不断增加，外延晶圆的市场正在稳步增长。随着各行业继续推动技术的边界，对创新材料的需求只会加剧。专门生产外延晶圆的公司处于这一趋势的前沿，不断研究和开发新技术以提高质量和效率。总之，外延晶圆的概念对于半导体行业和电子技术的进步至关重要。通过精确控制材料特性和创造复杂结构，外延晶圆促进了推动我们现代世界的尖端设备的发展。随着技术的不断发展，理解和掌握外延晶圆的生产将对工程师和科学家而言始终是至关重要的。